Company Profile
Products
Services
16 Processing Chambers For High Throughput Up To 1,000 WPH
Hybrid type cleaning system combining chemical etching/cleaning functions as well as a brush cleaning function
Seventh Generation System Inherits SCREEN's Single Wafer Cleaning DNA Industry-leading Processing Technologies Meet High-throughput 24 Chamber Design
SOKUDO DUO High Productivity, >450 WPH Capable Dual Track System
Wet Station
Spin Processor
Spin Scrubber
_Spin Scrubber(Brush and Chemical Cleaning)