Products

• Coat/Develop Track

  • Coat/Develop Track DT-3000（LithoSpinDUO-S）
  • Coat/Develop Track DT-3000（SOKUDO DUO）
  • Coat/Develop Track RF-310A
  • Coat/Develop Track SK-60EX/80EX
  • Spray Coater SC-80EX

• Wafer Cleaning System

  Wet Station

  • Wet Station FC-3100
  • Wet Station WS-620C/WS-820L
  • Wet Station FC-821L
  • Compact Wet Station CW-2000
  • Compact Wet Station CW-1500

  Spin Processor

  • Single Wafer Cleaner SU-3300
  • Single Wafer Cleaner SU-3200
  • Single Wafer Cleaner SU-3100
  • Single Wafer Cleaner SU-2000

  Spin Scrubber

  • Spin Scrubber SS-3200
  • Spin Scrubber SS-3100
  • Spin Scrubber SS-80EX

  Polymer Removal

  • Single Wafer Cleaner SU-3100
  • Single Wafer Cleaner SU-2000

• Annealing System

  • Laser Annealer LT-3100
  • Flash Lamp Annealer LA-3100
  • Flash Lamp Annealer LA-3000-F
  • Infrared lamp Annealer LA-830

• Measurement System

  • Ellipsometric Film Thickness Measurement System RE-3500
  • Spectroscopic Film Thickness Measurement System VM-2200/3200
  • Spectroscopic Film Thickness Measurement System VM-1200/1300
  • Spectroscopic Film Thickness Measurement System VM-1020

• Inspection System

  • Wafer Pattern Inspection System ZI-3500
  • Wafer Pattern Inspection System ZI-2000

• Advanced Packaging Lithography

  • Direct Imaging System for Panel Level Packages DW-6000
  • Direct Imaging System for Advanced Packaging DW-3000