- Font size
- A
- A
-
Spin Scrubber
SS-3300S
16 Processing Chambers For High Throughput Up To 1,000 WPH
-
Spin Scrubber（Brush and Chemical Cleaning）
SB-3300
Hybrid type cleaning system combining chemical etching/cleaning functions as well as a brush cleaning function
-
Single Wafer Cleaner
SU-3300
Seventh Generation System Inherits SCREEN's Single Wafer Cleaning DNA
Industry-leading Processing Technologies Meet High-throughput 24 Chamber Design
-
Coat/Develop Track
DT-3000
SOKUDO DUO
High Productivity, >450 WPH Capable Dual Track System
Systems for leading-edge semiconductor devices
(300 mm)
Wafer Cleaning System
Wet Station
Spin Processor
Spin Scrubber
Spin Scrubber（Brush and Chemical Cleaning）
Polymer Removal
Coat/Develop Track
Annealing System
Measurement System
Inspection System
Advanced Packaging Lithography
Products
-
- Wafer Cleaning System
-
Wet Station
- Wet Station FC-3100
- Wet Station WS-620C/WS-820C/WS-820L
- Wet Station FC-821L
- Compact Wet Station CW-2000
Spin Processor
- Single Wafer Cleaner SU-3300
- Single Wafer Cleaner SU-3200
- Single Wafer Cleaner SU-2000
- Spin Processor SP-2100
Spin Scrubber
_Spin Scrubber(Brush and Chemical Cleaning)
-
- Advanced Packaging Lithography
