High Throughput Batch Cleaning Systems
Enable Flexible Line Configurations
Choose either the WS-620C for 150 mm wafers or WS-820C for 200 mm wafers with carrier transfer processing, or the WS-820L for 200 mm wafers with carrierless transfer processing.
Systems can be configured freely, depending on the application. Processing bath configurations can incorporate up to 13 baths.
Multiple baths can be installed and up to six transfer robots can be mounted to ensure high throughput.
Optimized processing bath design, strict chemical management, and clean drying units contribute to stable, high-quality processing.
A wide range of peripheral devices are available, including wafer transfer units and cassette stockers.
A low-pressure drying unit can be mounted to reduce watermarks and ensure clean drying.
(Available only for WS-820L)
Wet Station
Spin Processor
Spin Scrubber
_Spin Scrubber(Brush and Chemical Cleaning)