1. All-in-One concept
The chemical supply and cooling units on the CW-2000 are integrated into the system to reduce footprint. The CW-2000 requires 45% less space than our previous model.
2. Handles a diverse variety of wafer processing
A single CW-2000 system can handle a wide range of wafer sizes, from 50 mm to 200 mm.
3. New drying unit available
Adding to the previous DIS (Drain & IPA Substitution) drying unit, the new lineup includes an eco-friendly Hot Blow-Drying system (HBD) that does not use IPA. Customers are free to select the unit appropriate for their usage conditions.
4. Flexible expansion
The CW-2000 can be expanded to include four, six or eight processing baths, to match your productivity and the space available for installation.
5. Higher productivity
The CW-2000 achieves 150 WPH, with 1.5 times greater productivity than our previous model. Half-pitch specifications are also available (optional), boosting your productivity to a maximum of 300 WPH.
6. Supports RCA cleaning
The CW-2000 also supports RCA cleaning, which has been the mainstream cleaning method for semiconductors, effectively boosting yields.