Single Wafer Cleaner
SU-3300
A single-wafer cleaner combining the outstanding productivity of up to 24 chambers resulting in high processing technology
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24 chamber configuration
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4level, 6tower construction
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Single chamber servicing
Features
1. Equipped with the industry's largest of 24 chambers
Achieving high productivity through a maximum chamber capability of 4 stages x 6 towers.
2. Significant elimination of micropattern collapse
Cutting-edge drying technology regulates the air-liquid interface on the wafer with high accuracy and speed. The temperature and humidity in the chamber are constantly controlled in the optimal state and are effectively preventing the collapse of increasingly finer, fragile patterns with high aspect ratios.
3. APAC2*: taking chamber cleanliness to new standards
The ultra-cleaning technology "APAC" installed in the SU-3200 has evolved. The processing environment inside the chamber was improved with the new technology ASC (Advanced Stream Control), which controls the airflow inside the chamber with precision and contributes to the consistencies between chambers.
- *APAC2: Abbreviation for Advanced Process Atmosphere Control 2, our unique technology for chamber cleaning
Products
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- Wafer Cleaning System
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Wet Station
- Wet Station FC-3100
- Wet Station WS-620C/WS-820C/WS-820L
- Wet Station FC-821L
- Compact Wet Station CW-2000
Spin Processor
- Single Wafer Cleaner SU-3400
- Single Wafer Cleaner SU-3300
- Single Wafer Cleaner SU-3200
- Single Wafer Cleaner SU-2000
- Spin Processor SP-2100
Spin Scrubber
_Spin Scrubber(Brush and Chemical Cleaning)
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- Annealing System
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- For Photomasks