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Spectroscopic Film Thickness Measurement System
VM-1200/VM-1300
A desktop model that can be incorporated into production lines
1. The CCD image sensor in the spectrometer makes simultaneous measurement possible across the full range of wavelengths in the visible spectrum, as well as high-speed, high-accuracy measurement of film thicknesses.
2. Recipe wizard function for easy operation.
3. Supports a wide range of measurement data processing functions including 3D mapping, film thickness data compensation, histogram displays, and a range of other statistical tools.
4. Automatic measurement with auto-stage and auto-focus functions.
5. Standard setup capable of measuring the thickness and spectral reflectance of 25 kinds of films. A wide variety of measurement programs are available to support measurements for other film types.
6. Simultaneous multi-layer measurements for up to 4 layers of film.
Products
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- Wafer Cleaning System
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Wet Station
- Wet Station FC-3100
- Wet Station WS-620C/WS-820C/WS-820L
- Wet Station FC-821L
- Compact Wet Station CW-2000
Spin Processor
- Single Wafer Cleaner SU-3400
- Single Wafer Cleaner SU-3300
- Single Wafer Cleaner SU-3200
- Single Wafer Cleaner SU-2000
- Spin Processor SP-2100
Spin Scrubber
_Spin Scrubber(Brush and Chemical Cleaning)
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- Annealing System
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- Advanced Packaging Lithography
