SCREEN Semiconductor Solutions Co., Ltd.

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Wet Station

WS-620C/ WS-820C/ WS-820L

High Throughput Batch Cleaning Systems
Enable Flexible Line Configurations

  • 150mm-200mm

1. Two Transfer Types

Choose either the WS-620C for 150 mm wafers or WS-820C for 200 mm wafers with carrier transfer processing, or the WS-820L for 200 mm wafers with carrierless transfer processing.

2. Flexible Design

Systems can be configured freely, depending on the application. Processing bath configurations can incorporate up to 13 baths.

3. High Throughput

Multiple baths can be installed and up to six transfer robots can be mounted to ensure high throughput.

4. High-quality Processing

Optimized processing bath design, strict chemical management, and clean drying units contribute to stable, high-quality processing.

5. Extensive Lineup of Peripheral Devices

A wide range of peripheral devices are available, including wafer transfer units and cassette stockers.

6. Prevention of Watermarks

A low-pressure drying unit can be mounted to reduce watermarks and ensure clean drying.
(Available only for WS-820L)

  • QDR : Quick Dump Rinsing bath / FR : Final Rinsing bath
  • SD : Spin Dryer / EDR : Dump Rinsing bath