20/20 Visions on Lithography in 2020
Wednesday, July 15, 2015
SEMICON West 2015 Partner Event
Location: San Francisco Marriott Marquis, Salon 9
Mission & 4th Street, San Francisco, California
| 07:30am |
Breakfast Opens
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| 07:50am |
Master of Ceremonies, SCREEN Breakfast Forum
Olivier Vatel, Chief Technology Officer (CTO)
SCREEN Semiconductor Solutions Co., Ltd.
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| 07:55am |
"Lithography in the 3D NAND & Emerging Memory Era"
John Whitman, Director R&D Process Development,
NAND & Emerging Memories
MICRON Technology, Inc.
|
| 08:40am |
"Cleaning Technologies Enabling Multi-Patterning Yield"
Jim Snow, Program Manager, Technology & Marketing
SCREEN SPE USA, LLC
|
| 09:00am |
"Device Fabrication using Nanoimprint Lithography & Challenges for Nano-Defect Management"
Tatsuhiko Higashiki , Senior Fellow,
Center for Semiconductor R&D
TOSHIBA Semiconductor & Storage Products Co.
|
| 09:30am |
"Next Generation Track Processes for EUVL, DSA, NIL, E-Beam"
Charles Pieczulewski, Deputy GM, Business Mngt.
SCREEN Semiconductor Solutions Co., Ltd.
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| 09:50am |
Closing Remarks, Master of Ceremonies |
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For general inquiries regarding SCREEN Breakfast Forum please contact us at:
breakfastforum@screen.co.jp
Hosted by SCREEN Semiconductor Solutions Co., Ltd. in cooperation with SEMI, in conjunction with SEMICON West 2015.
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