Adopts a unique plasma source to achieve ultra-high-speed, high-quality vacuum film deposition

SCREEN's proprietary LIA™ (Low Inductance Antenna) ICP plasma technology realizes low-damage, high-density plasma generation.


  1. High-density plasma generation by ICP plasma technology
  2. Low antenna potential reduces plasma damage
  3. Multi-antenna structure enables plasma generation of the desired shape and size.
  4. High-speed and uniform processing even with large substrates.

Related Products

LIA™ Plasma CVD

LIA™ Sputter

For more information on LIA™ plasma technology,
visit EMD corporation (SCREEN group) website (Japanese)

* LIA is a registered trademark and/or a trademark of EMD Corporation.