Vacuum film deposition
Adopts a unique plasma source to achieve ultra-high-speed, high-quality vacuum film deposition
SCREEN's proprietary LIA™ (Low Inductance Antenna) ICP plasma technology realizes low-damage, high-density plasma generation.
- High-density plasma generation by ICP plasma technology
- Low antenna potential reduces plasma damage
- Multi-antenna structure enables plasma generation of the desired shape and size.
- High-speed and uniform processing even with large substrates.
LIA™ Plasma CVD
For more information on LIA™ plasma technology,
visit EMD corporation (SCREEN group) website (Japanese)
* LIA is a registered trademark and/or a trademark of EMD Corporation.