Products

• Wafer Cleaning System

  Wet Station

  • Wet Station FC-3100
  • Wet Station WS-620C/WS-820C/WS-820L
  • Wet Station FC-821L
  • Compact Wet Station CW-2000

  Spin Processor

  • Single Wafer Cleaner SU-3400
  • Single Wafer Cleaner SU-3300
  • Single Wafer Cleaner SU-3200
  • Single Wafer Cleaner SU-2000
  • Spin Processor SP-2100

  Spin Scrubber

  • Spin Scrubber SS-3300S
  • Spin Scrubber SS-3200
  • Spin Scrubber SS-3200 for 200mm
  • Spin Scrubber SS-80EX

  _Spin Scrubber(Brush and Chemical Cleaning)

  • Backside Cleaner SB-3300

• Coat/Develop Track

  • Coat/Develop Track RF-200EX/RF-300EX
  • Coat/Develop Track DT-3000（SOKUDO DUO）
  • Coat/Develop Track SK-60EX/SK-80EX
  • Spray Coater SC-80EX

• Annealing System

  • Flash Lamp Annealer LA-3100

• Measurement System

  • Ellipsometric Film Thickness Measurement System RE-3500
  • Spectroscopic Film Thickness Measurement System VM-2500/VM-3500
  • Spectroscopic Film Thickness Measurement System VM-1200/VM-1300
  • Spectroscopic Film Thickness Measurement System VM-1020

• Inspection System

  • Wafer Pattern Inspection System ZI-3600
  • Wafer Pattern Inspection System ZI-2000

• Advanced Packaging Lithography

  • Direct imaging system for advanced packages DW-3100
  • Direct imaging system for advanced packages DW-3100(for PLP)
  • Direct Imaging System for Next-Generation Patterning LeVina
  • Slit Coater System for Panel Level Packaging Lemotia

• For Photomasks

  • Automatic Dimension Measurement System DR-8000