RF3S established the 180WPH extension of the highly reliable and productive RF3 platform foundation. Following upon the Reliable, Fast, Fine and Flexible design concept, the RF3S integrates various unique technologies to produce high performance for a wide range of coat, develop and bake processes including both dry and immersion lithography.
Simple hardware and software enable high reliability.
High throughput designed for various process flows.
Features the latest technology for today’s cutting-edge, finer pattern processing.
Uses a modular design that is inherently flexible and expandable.
The adaptable equipment design makes it possible to deliver and assemble the RF3 quickly.