Wet Station
CW-2000
【Wafer size 50mm ~ 200mm】
Half the Footprint, 1.5 Times the Productivity! Excellent Cost-Performance!
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Wafer size 150mm ~ 200mm
Wafer Cleaning System / Wet StationWS-620C/
WS-820C/
WS-820L
High Throughput Batch Cleaning Systems Enable Flexible Line Configurations
1. Two Transfer Types
Choose either the WS-620C for 150 mm wafers or WS-820C for 200 mm wafers with carrier transfer processing, or the WS-820L for 200 mm wafers with carrierless transfer processing.
2. Flexible Design
Systems can be configured freely, depending on the application. Processing bath configurations can incorporate up to 16 baths.
3. High Throughput
Multiple baths can be installed and up to six transfer robots can be mounted to ensure high throughput.
4. High-quality Processing
Optimized processing bath design, strict chemical management, and clean drying units contribute to stable, high-quality processing.
5. Extensive Lineup of Peripheral Devices
A wide range of peripheral devices are available, including wafer transfer units and cassette stockers.
6. Prevention of Watermarks
A low-pressure drying unit can be mounted to reduce watermarks and ensure clean drying.
QDR : Quick Dump Rinsing bath / FR : Final Rinsing bath
SD : Spin Dryer / EDR : Dump Rinsing bath
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Wet Station
FC-821L
【Wafer size 200mm】
Compact Half-pitch and One-bath Batch Cleaning System
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