Ellipsometric Film Thickness Measurement System
RE-3500
【Wafer size 125mm ~ 300mm】
Measurement Equipment to Support Electronic Devices for loT.
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Wafer size 100mm ~ 300mm
Spectroscopic Film Thickness Measurement SystemVM-1200/
VM-1300
A desktop model that can be incorporated into production lines
Features
- The CCD image sensor in the spectrometer makes simultaneous measurement possible across the full range of wavelengths in the visible spectrum, as well as high-speed, high-accuracy measurement of film thicknesses.
- Recipe wizard function for easy operation.
- Supports a wide range of measurement data processing functions including 3D mapping, film thickness data compensation, histogram displays, and a range of other statistical tools.
- Automatic measurement with auto-stage and auto-focus functions.
- Standard setup capable of measuring the thickness and spectral reflectance of 25 kinds of films. A wide variety of measurement programs are available to support measurements for other film types.
- Simultaneous multi-layer measurements for up to 4 layers of film.
- Capable of performing refractive index measurements.
- LAN support for easy connections to inter-fab networks (option).
Other
Spectroscopic Film Thickness Measurement System
VM-2500/
VM-3500
【Wafer size 100mm ~ 300mm】
High-speed mode achieves a high throughput of 160 WPH, optimal for multipoint measurement of communications devices and other products.
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Spectroscopic Film Thickness Measurement System
VM-1020
【Wafer size 50mm ~ 300mm】
Microscope model that is ideal for R&D
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