Spin Scrubber
SS-80EX
【Wafer size 100mm ~ 200mm】
Advanced Scrubber Featuring the Same Stability and Reliability as the Highly Regarded SS Series.
Wet Station
CW-2000
【Wafer size 50mm ~ 200mm】
Half the Footprint, 1.5 Times the Productivity! Excellent Cost-Performance!
Wet Station
WS-620C/
WS-820C/
WS-820L
【Wafer size 150mm ~ 200mm】
High Throughput Batch Cleaning Systems Enable Flexible Line Configurations
Wet Station
FC-821L
【Wafer size 200mm】
Compact Half-pitch and One-bath Batch Cleaning System
Spin Processor
SU-2000
【Wafer size 150mm ~ 200mm】
Inherits High-end Single Wafer Cleaning Technology to Deliver Outstanding Cost Performance
Spin Processor
SP-2100
【Wafer size 76mm ~ 200mm】
Outstanding functionality and scalability easily handle emerging needs
Coat/Develop Track
SK-60EX/
SK-80EX
【Wafer size 150mm ~ 200mm】
Flexibility to Process a Variety of Substrates
Spray Coater
SC-80EX
【Wafer size 100mm ~ 200mm】
Flexible, Optimized Coating of MEMS with 3D Structures
Spectroscopic Film Thickness Measurement System
VM-2500/
VM-3500
【Wafer size 100mm ~ 300mm】
High-speed mode achieves a high throughput of 160 WPH, optimal for multipoint measurement of communications devices and other products.
Spectroscopic Film Thickness Measurement System
VM-1200/
VM-1300
【Wafer size 100mm ~ 300mm】
A desktop model that can be incorporated into production lines
Spectroscopic Film Thickness Measurement System
VM-1020
【Wafer size 50mm ~ 300mm】
Microscope model that is ideal for R&D