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SCREEN Semiconductor Solutions Co., Ltd.

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Coat/Develop Track

DT-3000

High Productivity, >450 WPH Capable Dual Track System

  • 300mm
  • SOKUDO DUO

1. High-Throughput while Ensuring High Reliability

Running dual, parallel process lines dramatically improves wafer throughput. Since the load is distributed between two separate lines, the SOKUDO DUO also contributes to higher wafer handling robotics reliability since it enables reduced wafer transfer speeds without compromising wafer throughput.

2. Non-Stop Operation Delivers High Productivity

The dual-flow concept makes it possible to run each wafer process line independently. Maintenance can be performed while the system is running production, greatly reducing system downtime. The overall lithography cell wafer output, productivity is optimized by keeping the coat/develop process running so that expensive photolithography exposure scanner time is not wasted.

3. Small Footprint & Flexible Configuration

The dual process line system is a compact platform design that significantly reduces footprint. Various system configurations can be tailored to match specific coat/develop applications to deliver optimized wafer output for the available clean-room area.

4. Advanced Lithography Technology

With SCREEN’s over 30-year technical know-how, the system supports advanced immersion ArF lithography, EUV, E-Beam and Directed Self-Assembly (DSA) coat / develop / bake track solutions to realize high yield for volume production.

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