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SPIE Advanced Lithography 2009

SPIE Advanced Lithography 2009
Dates: February 22-27, 2009 (Sunday – Friday)
Venue: San Jose Convention Center, San Jose, California (USA)
For more information see http://spie.org/advanced-lithography.xml


Exhibition Overview
SOKUDO Co., Ltd. will showcase the RF3S coater/developer system and introduce SOKUDO's advanced technologies for immersion lithography at the exhibit booth 413.

Exhibition Dates: Tue. 24th February 2009 (10 a.m. to 5 p.m.)
  Wed. 25th February 2009 (10 a.m. to 4 p.m.)

Technical Conference
SOKUDO Co., Ltd. will present 1 paper (oral) presentation and 8 posters at the Conference.

The paper titles are also listed on the back cover of the Technical Program.

SOKUDO is one of the sponsors of this event. 

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