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SOKUDO Lithography Breakfast Forum 2011

SOKUDO Lithography Breakfast Forum 2011
Theme: I Need More "E" Power, Scotty!

Date: Wednesday, July 13, 2011
Time: 07:30 Breakfast, 08:00-10:00 Presentations
Location: San Francisco Marriott Marquis,
 Mission & 4th Street, San Francisco, CA

18th Annual SOKUDO Lithography Breakfast Forum Theme:

Technical progress is being made in next generation lithography for 2xnm node by alternative exposure technologies such as Extreme UltraViolet (EUV) and E-Beam Mask-Less Lithography (ML2). However, immersion ArF (optical) lithography extensions remain as primary driver for the near-future. Both EUV and ML2 confront one common challenge: Insufficient “EUV, Electron, Exposure” power on wafer. Hence the theme: I Need More “E” Power, Scotty!



  GLOBALFOUNDRIES (Yayi Wei, Senior Member of Technical Staff, AMTD Lithography)
View Presentation (PDF7: 0.2MB)
  NIKON (Steve Renwick, Sr. Principle Eng., NPI) on Optical Extensions
View Presentation (PDF7: 2.3MB)
  MAPPER LITHOGRAPHY (Bert Jan Kampherbeek, VP Business Development) on E-Beam
View Presentation (PDF7: 0.6MB)
  ASML (Skip Miller, Director, Strategic Marketing) on EUV Lithography
View Presentation (PDF7: 4.7MB)
  XTREME Technologies (Marc Corthout, President) on EUV Source
View Presentation (PDF7: 1.8MB)

SEMATECH (Stefan Wurm, Assoc. Director of Lithography) on Lithography Collaborations
View Presentation (PDF7: 2.2MB)


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