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Univac's AR and AF coating systems IBAD

Univac's AR and AF coating systems IBAD

Univac's leading electron beam evaporation system, providing optimized formation of a wide variety of optical films

Features

  1. Formation of films at low temperatures
  2. Independently developed diffusion pump that significantly shortens exhaust times
  3. Stable coating and outstanding uniformity that maintain maximum production volumes
  4. Simple, user-friendly operation
  5. Structure that enables extremely easy maintenance

Ion Beam Source (End-hall type)

Coating quality control

An ion beam helps achieve improved adhesion and coating density.
This system also keeps down absorption and diffusion, making it possible to control curvature and coating stress.
An RF grid type featuring high ion energy is also available.

Electron Beam Source Module and Crucibles

High-efficiency heating

Evaporation of materials with a high melting point such as tungsten (W), tantalum (Ta), molybdenum (Mo), oxides and so on is possible due to direct heating of the material.

Non-reactive crucible

This unit uses a water-cooled copper crucible allowing for evaporation of pure materials, since there is no reaction between the material and crucible from heated vapor deposition.

Reduced operating costs

A highly resilient tungsten filament is used as the source for the electron beam. This offers significantly lower operating costs compared with resistance heating.

Coating performance (example)

 Number of layers
6-11  
 Reflectivity (AR)
≤ 1.0%  
 Contact angle (AF)
≥ 110°  
 Substrate size
250 x 170 mm  
 Processing count per batch
45 pcs.  
 Takt time
80 min.  

IBAD Series

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UNIVAC-900
Size: Φ900 x 1,080H

UNIVAC-1050
Size: Φ1,050 x 1,280H
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UNIVAC-1200
Size: Φ1,200 x 1,080H
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UNIVAC-1350
Size: Φ1,350 x 1,400H
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UNIVAC-1500
Size: Φ1,500 x 1,500H
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UNIVAC-1650
Size: Φ1,650 x 1,850H
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UNIVAC-2700
Size: Φ2,700 x 1,750H
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UNIVAC-2000H
Size: Φ2,000 x 1,750H

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