<Crystal Silicon Type>
- HF vapor phase processing significantly reduces the amount of HF used and waste liquid produced.
- The PV-1500-V reduces the amount of time required for PSG film removal.
- Wafer surfaces are almost dry after PSG film removal, preventing chemicals from being transferred into the rinsing bath.
- Since no chemical is transferred, rinsing time is shorter and the amount of DI water required is significantly reduced.