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PV Equipment
<Thin Film Processing> Measurement System (RE-8000)
<Thin Film Processing>Cleaning/Etching Processor
<Crystal Silicon> PSG Vapor Cleaning Machine
<Crystal Silicon> Texture Processing Equipment
<Crystal Silicon> Raw silicon cleaning Equipment
<Crystal Silicon / Thin Film Prcessing> Slit-type coater
Inert Gas Circulation Refining System
<Crystal Silicon>Batch-type diffusion furnace system for PV

<Crystal Silicon Type> PSG Vapor Cleaning Machine PV-1500-V

<Crystal Silicon Type>
PSG Vapor Cleaning Machine
PV-1500-V

Using technology cultivated in the semiconductor manufacturing process, the PV-1500-V removes the phosphorus glass film from the silicon wafer and automatically carries out the following processes.

PSG film removal using HF vapor phase > DI water shower rinsing > IPA drying

Features

  • HF vapor phase processing significantly reduces the amount of HF used and waste liquid produced.
  • The PV-1500-V reduces the amount of time required for PSG film removal.
  • Wafer surfaces are almost dry after PSG film removal, preventing chemicals from being transferred into the rinsing bath.
  • Since no chemical is transferred, rinsing time is shorter and the amount of DI water required is significantly reduced.