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PV Equipment
<Thin Film Processing> Measurement System (RE-8000)
<Thin Film Processing>Cleaning/Etching Processor
<Crystal Silicon> PSG Vapor Cleaning Machine
<Crystal Silicon> Texture Processing Equipment
<Crystal Silicon> Raw silicon cleaning Equipment
<Crystal Silicon / Thin Film Prcessing> Slit-type coater
Inert Gas Circulation Refining System
<Crystal Silicon>Batch-type diffusion furnace system for PV
 

<Crystal silicon>
Raw silicon cleaning equipment

This equipment makes use of technologies created for semiconductor processes to remove particles attached to raw silicon, enabling contamination-free cleaning.
To remove contamination, the raw silicon is placed in a bucket and chemical and DI water cleaning are performed repeatedly.

Features

  • HF cleaning is applied to quickly remove particles.
  • The compact unit also offers significantly lower chemical consumption.

[Options]
A vacuum drying unit can be added to achieve optimal results.