Accommodates up to G5 size, Volume production model for fine patterning

Feature

1. A vertical proximity exposure system that does not require distortion compensation.
2. Unique optical gap sensor enables quick, accurate, noncontact setting of proximity gap between mask and substrate.
3. Unique optical edge sensor enables accurate, non-contact alignment with substrate edges.
4. Original high-speed image processing enables accurate alignment of mask or mask and substrate.(Pin alignment is also possible.)
5. Features a mask library that stores 3 masks with cases.
   Masks can be changed automatically.