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Coat/Develop Track RF-310A

Coat/Develop Track RF-310A

RF3S established the 180WPH extension of the highly reliable and productive RF3 platform foundation. Following upon the Reliable, Fast, Fine and Flexible design concept, the RF3S integrates various unique technologies to produce high performance for a wide range of coat, develop and bake processes including both dry and immersion lithography.

Features

Reliable
Simple hardware and software enable high reliability.

Fast
High throughput designed for various process flows.

Fine
Features the latest technology for today's cutting-edge, finer pattern processing.

Flexible
Uses a modular design that is inherently flexible and expandable. The adaptable equipment design makes it possible to deliver and assemble the RF3 quickly.


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