Compact Wet Station CW-1500
Features
- The CW-1500 automatic batch cleaning system is equipped with a full range of essential functions and features a competitive cost and 64 percent smaller footprint than the previous WS-620C model.
- The CW-1500 is equipped with a highly flexible transfer arm.
- Complicated and hazardous manual chemical cleaning tasks can now be completed safely and efficiently with no chemical processing time variation.
- All processes from chemical cleaning to rinsing are fully automated, ensuring more consistent processing time and better etching uniformity.
- Either spin or newly developed DIS* (IPA) drying can be selected to suit the process and application. DIS* (IPA) drying significantly reduces VOC emissions.
- The CW-1500 supports a wide range of applications from R&D and prototyping to small-lot production and pilot lines for mass production.
Specifications
| Wafer | φ50 mm to φ200 mm |
| Transportation | Robot transfer system |
| Processing | Batch processing |
| Unit of processing | 1 carrier |
| Drying | DIS* (IPA) drying or spin drying |
| Max. no. of processing baths | 6 baths (Max. no. of chemical processing baths: 3) |
| Dimensions (WxDxH) | 2,700 mm x 1,350 mm x 2,580 mm |
| Weight | Approx. 1,600 kg |
