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SOKUDO Lithography Breakfast Forum 2013

20th Annual
SOKUDO Lithography Breakfast Forum

450mm Patterning out of Darkness

Date: Wednesday, July 10, 2013
Time:
07:30 Breakfast, 08:00-10:00 Presentations
 
Location:

San Francisco Marriott Marquis

 

 

Program:

  MOLECULAR IMPRINTS
Paul Hofemann, VP, Corporate Marketing
View Presentation (PDF: 1.5MB)
 
  CANON
Doug Shelton, Sales & Marketing Manager
View Presentation (PDF: 1.8MB)
 
  ULTRATECH
Doug Anberg, VP, Advanced Stepper Technology
View Presentation (PDF: 0.7MB)
 
  NIKON
Donis Flagello, Fellow, Nikon Research Corp. America
View Presentation (PDF: 1.0MB)
 
  ASML
Skip Miller, Director, Strategic Marketing
View Presentation (PDF: 2.0MB)
 
Immersion ArF multi-patterning, EUV, Multi-E-beam, nanoimprint, Directed Self-Assembly (DSA), and even back-end lithography applications would all (or only the cost effective winners) need to make transition from 300mm to 450mm wafer size. Nanoimprint established the first 450mm patterned wafers early 2013. Will we continue 450mm patterning in darkness? Are there alternatives? When will the dawn of lithography light come for 450mm wafer patterning?




World's first full 450mm optical lithography exposed wafer presented by Charles Pieczulewski, SOKUDO, and Doug Shelton, CANON.


The SOKUDO Lithography Breakfast Forum 2013 is hosted by SOKUDO Co., Ltd., in cooperation with SEMI


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