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3rd International Symposium on Immersion Lithography

3rd International Symposium on Immersion Lithography
Location: Kyoto, Japan
Venue: ANA Hotel Kyoto
Period: Oct. 2-5, 2006


SOKUDO Technical Papers at the 3rd International Symposium on Immersion Lithography
Poster Session Wednesday, October 4th

DP-24
“Long-term Immersion Defect Monitoring on Production Exposure Scanner and Coat/Develop Track In-Line Lithocell”,
Kazuhito Shigemori*, Masashi Kanaoka, Masami Asai, Coen Verspaget (SOKUDO),
Richard Moerman, Cedric Grouwstra (ASML)


DP-25
“Watermark and Satellite Defect Reduction Process Optimization on Coat / Develop Track System”,
Masakazu Sanada*, Kazuhito Shigemori, Tadashi Miyagi, Masami Asai, Shuichi Yasuda,
Masashi Kanaoka, Shinpei Hori (SOKUDO)

SEMATECH WEB SITE
http://www.sematech.org/meetings/announcements/7799/


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