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15th Annual SOKUDO Lithography Breakfast Forum

"Double Patterning Challenges"           


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Program: 07:15am Breakfast & Poster Preview
              08:00am Forum Presentations
              10:00am Poster Session

This year's theme "Double Patterning Challenges" featured perspectives from semiconductor manufacturer AMD as well as lithography equipment (ASML, Nikon, Canon); materials (JSR, FujiFilm, AZ); coat/develop track (SOKUDO); and related double patterning process (Applied Materials) market players. Forum presentations were followed by a poster session and opportunity for individual question-and-answer engagement with company representatives.

For more details see on-line SEMICONDUCTOR INTERNATIONAL article "Double Patterning Battles Cost, Complexity" by Aaron Hand: http://www.semiconductor.net/article/CA6579281.html?industryid=47299

 

Presentation Files

Harry J. Levinson: AMD View Presentation (PDF:1.03MB)
Mark Slezak: JSR Micro View Presentation (PDF:1,812KB)
Glen Mori: SOKUDO View Presentation (PDF:1,317KB)
Chris Ngai: Applied Materials View Presentation (PDF:2,145KB)
Bob Socha: ASML View Presentation (PDF:1,570KB)
Chris Sparkes: Nikon View Presentation (PDF:439KB)

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