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LIA Dry Etching Equipment VE-R400G

LIA Dry Etching Equipment VE-R400G

Features

  1. Dry etching equipment for testing, research, evaluation, and trial production.
  2. Using the assistive effect of LIA-ICP (Inductively Coupled Plasma) for high speed, high accuracy etching.
  3. Low pressure, high-speed etching equipment with LIA-ICP.
  4. Multipoint control (either manual or automatic) enables more detailed uniformity. Various other options are available as well.
  5. Deep etching also possible.
  6. Contact SCREEN in regard to a bias power supply for your particular needs. DP mode and RIE mode also available.
  7. Verification on this Laboratory Equipment can be easily fed back to production units.

R&D to mass production

 Supports mass-production of various substrate sizes.

Specifications

 Substrate type
Si, quartz, blue sheet glass, resist (organic layer) ashing
 Substrate size*
W400 x L500 mm
 Etching method
Static etching

* Contact us for other substrate sizes.

 

* LIA is a trademark of EMD Corporation.

 

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