LIA Plasma CVD Equipment VC-R400G/F
Features
- CVD equipment for testing, research, evaluation, and trial production
- Using LIA-ICP（Inductively Coupled Plasma) enables high speed, high accuracy deposition.
- Multipoint control (either manual or automatic) enables more detailed uniformity. Various other options are available as well.
- Newly developed bias power supply available for use with DLCs
- Ultra high-speed deposition possible (more than 5x faster than SCREEN's conventional units)
- Verification on this Laboratory Equipment can be easily fed back to production units.
R&D to mass production
Supports mass-production of various substrate sizes.
Specifications
| Model name | VC-R400G |
VC-R400F |
| Substrate type | Square substrate (Glass, Metal, etc.) |
Resin film (PET, PEN), metal foil |
| Target for deposition | DLC, SiN, SiO, etc. |
|
| Substrate size* | W400 x L500 mm |
500 mm width |
| Deposition method | Deposition down, static deposition (or in-line deposition) |
|
| Stage temp | Max. 500℃ |
|
* Contact us for other substrate sizes.
* LIA is a trademark of EMD Corporation.
