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LIA Plasma CVD Equipment VC-R400G/F

LIA Plasma CVD Equipment VC-R400G/F

Features

  1. CVD equipment for testing, research, evaluation, and trial production
  2. Using LIA-ICP(Inductively Coupled Plasma) enables high speed, high accuracy deposition.
  3. Multipoint control (either manual or automatic) enables more detailed uniformity. Various other options are available as well.
  4. Newly developed bias power supply available for use with DLCs
  5. Ultra high-speed deposition possible (more than 5x faster than SCREEN's conventional units)
  6. Verification on this Laboratory Equipment can be easily fed back to production units.

R&D to mass production

 Supports mass-production of various substrate sizes.

Specifications

 Model name
VC-R400G
VC-R400F
 Substrate type
Square substrate
(Glass, Metal, etc.)
Resin film (PET, PEN),
metal foil
 Target for deposition
DLC, SiN, SiO, etc.
 Substrate size*
W400 x L500 mm
500 mm width
 Deposition method
Deposition down, static deposition (or in-line deposition)
 Stage temp
Max. 500℃

* Contact us for other substrate sizes.

 

* LIA is a trademark of EMD Corporation.

 

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