Home > Products > Large Substrate Exposure System PA-6000 Series

Print

Large Substrate Exposure System PA-6000 Series

Large Substrate Exposure System PA-6000 Series

Features

  1. A vertical proximity exposure system that does not require distortion compensation.
  2. Unique optical edge sensor enables quick, accurate, noncontact setting of proximity gap between mask and substrate.
  3. Original high-speed image processing enables accurate alignment of mask or mask and substrate.
  4. Features a mask library that stores 4 masks with cases. Masks can be changed automatically.
  • Contact us

ページの先頭に戻る